With the deepening of reform and opening up, China has gradually caught up with the pace of western countries in most fields, which is worthy of our pride. However, there is one area that has always been a pain point for Chinese people, that is, the chip manufacturing industry. For various reasons, the development of China's chip industry is extremely difficult, even can be said to have no success. But Rome was not built in a day. To solve the problem of chip manufacturing, we can start with the important materials in chip manufacturing.

In July 2021, Jiangsu Nanda Optoelectronic Materials Co., Ltd. released the latest news on its official website. The news said that its ArF photoresist produced by its company has received a batch of orders from foreign customers, and can obtain foreign orders in the photoresist field, which is enough to show that its products have reached international standards.

First of all, what is photoresist. Photoresist refers to the material coated on the silicon wafer before photolithography. It is an important material in the process of making chips. According to the process level, it can be divided into five types: g line, i line, KrF, ArF and EUV.

ArF photoresist is generally used for 130nm-14nm, and can be used for 7nm DUV process at most. In the ArF photoresist market, the self-sufficiency rate of domestic ArF is only about 5%. This field is also monopolized by Japan and the United States. The breakthrough of domestic AF photoresist means that China has officially got rid of the grip of the United States and Japan in the ArF photoresist field.

We are still lagging behind in the field of chips, but nothing is certain. The breakthrough of Nanda Optoelectronics in the photoresist market can be said to lay a solid foundation for the development of China's semiconductor industry. In this way, step by step, China will also break the technological blockade in the chip field.